阿斯麦(ASML)作为全球极紫外光刻机领导者,盘中股价大涨5.05%,引发市场广泛关注。
这是由于美国劳伦斯利弗莫尔国家实验室(LLNL)开发出新型大孔径铥(BAT)激光器,可将EUV光源效率提高约10倍,为芯片制程工艺开辟了新的发展前景。纳米芯片的制造主要依赖EUV光刻技术,新型BAT激光器突破了现有EUV光源效率低下的局限,为制造更小、更快、更节能的芯片铺平了道路。
作为EUV光刻机龙头企业,阿斯麦必将积极开发商业化这项新技术。未来,BAT激光可望替代现行CO2激光,推动极紫外光刻进入新的发展阶段,预计将进一步巩固阿斯麦在行业内的领先地位。因此,这一重大科技进展加强了市场对阿斯麦长期发展潜力的信心,推动其股价大幅上涨。
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