如果您希望可以时常见面,欢迎标星 收藏哦~来源:内容编译自IBM Research,谢谢。在 NY CREATES 的奥尔巴尼纳米技术综合大楼工作的一组研究人员报告了Low NA 和High NA EUV 图案的最新良率,这显示了通往 2 纳米以下节点的途径。在过去的几十年里,计算能力的爆炸式增长依赖于晶体管尺寸的不断缩小。硅片上最小图案尺寸的缩小在很大程度上得益于光刻技术的进步。光刻技术利用光、...
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