ASML即将发货首台第二代High NA EUV光刻机EXE:5200
2 月 1 日消息，ASML 总裁兼首席执行官 Christophe Fouquet 在上月末的公司 2024 年第四季度财报电话会议上表示，该企业的首台第二代 0.55 (High) NA EUV 光刻机 TWINSCAN EXE:5200 即将以“早期工具”的身份开始发货，用于技术成熟度验证。
▲ EXE:5000 系统
EXE:5200 是现有初代 High NA EUV 光刻机 EXE:5000 的改进款，根据 Christophe Fouquet 的说法，该型号“更适合大批量生产”。而 EXE:5000 作为初期版本主要用于 High NA EUV 光刻技术的开发。
从 ASML 光刻系统的迭代规律来看，EXE:5200 预计将拥有更高的晶圆吞吐量（IT之家注：EXE:5000 为每小时 185 片以上），同时支持更为精细的后 2nm 逻辑半导体工艺。
▲ NXE:3800E 系统
Christophe Fouquet 还提到，其 0.33 (Low) NA EUV 光刻机的最新型号 NXE:3800E 已在工厂实现每小时 220 片的设计晶圆吞吐量，较初期的 185 片进一步提升，比前一代的 NXE:3600D 已高出 37.5%，充分发挥了结构改进带来的优势。
Disclaimer: Investing carries risk. This is not financial advice. The above content should not be regarded as an offer, recommendation, or solicitation on acquiring or disposing of any financial products, any associated discussions, comments, or posts by author or other users should not be considered as such either. It is solely for general information purpose only, which does not consider your own investment objectives, financial situations or needs. TTM assumes no responsibility or warranty for the accuracy and completeness of the information, investors should do their own research and may seek professional advice before investing.
Most Discussed
- 1
- 2
- 3
- 4
- 5
- 6
- 7
- 8
- 9
- 10