据韩媒FNnews报道,三星电子近日在其华城园区引入了ASML生产的High NA极紫外光刻(EUV)设备,旨在提升2纳米及以下制程的竞争力。ASML的High NA EUV设备“EXE:5000”是全球唯一能够提供此类设备的供应商,单台价格高达5000亿韩元。该设备通过增大透镜和反射镜尺寸,将数值孔径(NA)从0.33提升至0.55,显著提高了光刻精度,是2纳米及以下制程的必备工具。与现有EUV...
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