金吾财讯 | 据媒体报道，三星电子本月初在其华城园区引入了ASML生产的High NA极紫外光刻（EUV）设备，希望提升2纳米及以下制程的竞争力。
ASML 的 High NA EUV 设备“EXE:5000”是全球唯一能够提供此类设备的供应商，单台价格高达 5000 亿韩元。该设备通过增大透镜和反射镜尺寸，将数值孔径（NA）从 0.33 提升至 0.55，显著提高了光刻精度，是 2 纳米及以下制程的必备工具。
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