24亿一台!EUV光刻机引入,加速2nm工艺布局

半导体数据
14 Mar

汇集半导体行业资讯 技术前沿、发展趋势!3月14日,据韩国媒体报道,三星电子已在本月初于其华城园区成功引入首台由ASML公司生产的High-NA EUV光刻机——EXE:5000,该设备价值高达5000亿韩元(折合人民币约24.88亿元)。ASML作为全球唯一能够提供此类高端光刻机的供应商,其High NA EUV设备“EXE:5000”通过技术革新,显著提升了光刻精度,成为2纳米及以下先进制程...

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