为什么中国研发不出7nm的EUV光刻机?有3个原因

Ofweek光电信息网
21 Apr

大家都清楚,EUV光刻机是当前最先进的光刻机技术,可以用于7nm及以下芯片的制造,采用13.5nm波长的极紫外线,售价几亿美元一台。而这样的EUV光刻机,目前也只有荷兰的ASML一家能够制造,像日本的Cana、Nikon,以及中国的上海微电子,都无法制造。所以这就导致我们制造7nm及以下工艺时候时,被光刻机卡了脖子了。那么问题就来了,为何EUV光刻机,只有ASML一家能够制造出来,而我们研发不出来...

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